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As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it is increasingly important for new technologies to keep pace with these demands. Photomask technology is one of the key areas to achieving this goal. This valuable reference provides a comprehensive summary of all areas of mask technology in a single work, featuring contributions from 40 internationally reputable authors from industry, academia, government, national labs, and consortia. They discuss conventional masks and their supporting technologies, as well as next-generation technologies such as extreme ultraviolet, electron projection, ion projection, and X-ray lithography.
Syed Rizvi
Introduction. Introduction to Mask Making. Mask Writing. Data Preparation. Mask Writers: An Overview. E-Beam Mask Writers. Laser Mask Writers. Optical Masks. Optical masks: An Overview. Conventional Optical Masks. Advanced Optical Masks. NGL Masks. NGL Masks: An Overview. Masks for Electron Beam Projection Lithography. Masks for Extreme Ultraviolet Lithography. Masks for Ion Projection Lithography. Mask for Proximity X-Ray Lithography. Mask Processing, Materials, and Pellicles. Mask Substrate. Resists for Mask Making. Resist Charging and Heating. Mask Processing. Mask Materials: Optical Properties. Pellicles. Mask Metrology, Inspection, Evaluation, and Repairs. Photomask Feature Metrology. Optical Critical Dimension Metrology. Photomask Critical Dimension Metrology in the Scanning Electron Microscope. Geometrical Characterization of Mask Using SPM. Metrology of Image Placement. Optical Thin Film Metrology for Photomask Applications. Phase Measurement Tool for PSM. Mask Inspection: Theories and Principle. Tool for Inspecting Masks: Lasertec MD 2500. Tool for Mask Image Evaluation. Mask Repairs. Modeling and Simulation. Modeling and Simulation. Index.
