Surface Contamination and Cleaning

This volume documents the proceedings of the International Symposium on Surface Contamination and Cleaning, held in Newark, New Jersey, May 23-25, 2001. Because of the importance of this topic in many technological areas, tremendous efforts have been devoted to devise novel and more efficient ways to monitor, analyse and characterize contamination

Preface; Mapping of surface contaminants by tunable infrared-laser imaging; Monitoring cleanliness and defining acceptable cleanliness levels; Tracking surface ionic contamination by ion chromatography; A new method using MESERAN technique for measuring surface contamination after solvent extraction; Methods for pharmaceutical cleaning validations; Influence of cleaning on the surface of model glasses and their sensitivity to organic contamination; Decontamination of sensitive equipment; The fundamentals of no-chemistry process cleaning; Development of a technology for generation of ice particles; Cleaning with solid carbon dioxide pellet blasting; Development of a generic procedure for modeling of waterjet Cleaning; Experimental and numerical investigation of waterjet derusting Technology; Practical applications of icejet technology in surface processing; Correlating cleanliness to electrical performance; Qualifying a cleaning system for space flight printed wiring assemblies; Investigation of modified SC-1 solutions for silicon wafer cleaning; Performance qualification of post-CMP cleaning equipment in a semiconductor fabrication environment; Spatial and temporal scales in wet processing of deep submicrometer features ; Microdenier fabrics for cleanroom wipers ; Fine particle detachment studied by reflectometry and atomic force microscopy ; Dust removal from solar panels and spacecraft on Mars; Laser cleaning of silicon wafers: Prospects and problems; The future of industrial cleaning and related public policy-making