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Installieren Sie die genialokal App auf Ihrem Startbildschirm für einen schnellen Zugriff und eine komfortable Nutzung.
This volume documents the proceedings of the International Symposium on Surface Contamination and Cleaning, held in Newark, New Jersey, May 23-25, 2001. Because of the importance of this topic in many technological areas, tremendous efforts have been devoted to devise novel and more efficient ways to monitor, analyse and characterize contamination
Preface; Mapping of surface contaminants by tunable infrared-laser imaging; Monitoring cleanliness and defining acceptable cleanliness levels; Tracking surface ionic contamination by ion chromatography; A new method using MESERAN technique for measuring surface contamination after solvent extraction; Methods for pharmaceutical cleaning validations; Influence of cleaning on the surface of model glasses and their sensitivity to organic contamination; Decontamination of sensitive equipment; The fundamentals of no-chemistry process cleaning; Development of a technology for generation of ice particles; Cleaning with solid carbon dioxide pellet blasting; Development of a generic procedure for modeling of waterjet Cleaning; Experimental and numerical investigation of waterjet derusting Technology; Practical applications of icejet technology in surface processing; Correlating cleanliness to electrical performance; Qualifying a cleaning system for space flight printed wiring assemblies; Investigation of modified SC-1 solutions for silicon wafer cleaning; Performance qualification of post-CMP cleaning equipment in a semiconductor fabrication environment; Spatial and temporal scales in wet processing of deep submicrometer features ; Microdenier fabrics for cleanroom wipers ; Fine particle detachment studied by reflectometry and atomic force microscopy ; Dust removal from solar panels and spacecraft on Mars; Laser cleaning of silicon wafers: Prospects and problems; The future of industrial cleaning and related public policy-making
